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Conference
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
AIAA Missile Sciences Conference |
| Nov 18-20, 2008 at Naval Postgraduate School, Monterey California United States |
UIST '08: The 21st Annual ACM Symposium on User Interface Software and Technology |
| Nov 19-22, 2008 at TBD, Monterey California United States |
| UIST (ACM Symposium on User Interface Software and Technology) is the premier forum for innovations in the software and technology of human-computer interfaces. Sponsored by ACM's special interest groups on computer-human interaction (SIGCHI) and computer graphics (SIGGRAPH), UIST brings together researchers and practitioners from diverse areas that include traditional graphical & web user interfaces, tangible & ubiquitous computing, virtual & augmented reality, multimedia, new input & output devices, and CSCW. The intimate size, the single track, and comfortable surroundings make this symposium an ideal opportunity to exchange research results and implementation experiences. |
16th International Conference on Atomic Processes in Plasmas (ApiP 2009) |
| Mar 22-26, 2009 at The Embassy Suites, Monterey California United States |
| On behalf of the organizing committee, I would like to invite you to attend the 16th International Conference on Atomic Processes in Plasmas (APiP). The 16th APiP Confernece will be held in Monterey, California, March 22-26, 2009, at the Embassy Suites Monterey Bay - Seaside hotel. The APiP Conference is a bi-annual international conference with topics covering high-energy-density plasmas, magnetically confined fusion plasmas, astrophysical plasmas, fundamental atomic data and fundamental modeling and plasma diagnostics. Please see the conference website http://www.confcon.com/apip09 for further information. A detailed program of invited speakers is available at the conference website. In addition, we invite all attendees to submit abstracts for poster presentations to take place at the conference. Again, details are available on the conference website. |
SPIE Scanning Microscopy 2009 |
| May 4-7, 2009 at Portola Hotel, Monterey California United States |
| SPIE is proud to produce SPIE Scanning Microscopy 2009 (meeting formerly known as SCANNING). Papers are now being accepted in these areas: xe2x80xa2 Agricultural applications xe2x80xa2 Backscattering electron diffraction xe2x80xa2 Electron beam specimen interaction workshop xe2x80xa2 Focused ion beam (FIB) xe2x80xa2 Helium ion microscopy xe2x80xa2 Food analysis: microstructure, identification and counter-terrorism xe2x80xa2 Forensics applications xe2x80xa2 Graphic arts aspects of microscopy xe2x80xa2 Light microscopy xe2x80xa2 Materials microscopy and microanalysis xe2x80xa2 Medical applications of scanning microscopy xe2x80xa2 Microanalysis in SEM/EPMA/AEM xe2x80xa2 Microscopy and microanalysis: theory, instrumentation and techniques xe2x80xa2 Microwave preparation technology xe2x80xa2 Monte Carlo modeling for microscopy and microanalysis xe2x80xa2 Multidimensional microscopy xe2x80xa2 Museum applications xe2x80xa2 Nanotechnology and nanofabrication xe2x80xa2 Scanning cryo-HRSEM of chemical systems xe2x80xa2 Scanning probe microscopies xe2x80xa2 Semiconductor devices, materials, and process characterization xe2x80xa2 STEM xe2x80xa2 TEM xe2x80xa2 X- ray mapping in electron beam instruments Planned sessions include: xe2x80xa2 Ultrahigh resolution scanning electron microscopy xe2x80xa2 Focused ion beam microscopy/scanning microscopy and sample modification with beams of ions xe2x80xa2 Fast x-ray spectrometry/mapping with silicon drift detector (SDD) EDS xe2x80xa2 Forensic microscopy and microanalysis xe2x80xa2 Scanning microscopies for environment, health and safety aspects of engineered nanoparticles xe2x80xa2 Scanned probe microscopy xe2x80xa2 Industrial semiconductor and nanotechnology applications of SPM Workshops: xe2x80xa2 Electron beam/specimen interaction workshop xe2x80xa2 Characterizing nanoparticles (preparation and microscopy) xe2x80xa2 SEM calibration and evaluation for nanometrology xe2x80xa2 Application areas: materials, pharmaceuticals, biomedical materials, semiconductor manufacturing and devices, nanotechnology and nanofabrication, museum and archeological specimens xe2x80xa2 Confocal and other optical microscopy techniques xe2x80xa2 Cryo-SEM xe2x80xa2 Instrumentation xe2x80xa2 Multidimensional microscopy xe2x80xa2 Scanning microscopy in forensic science xe2x80xa2 Quality assurance for measurements in the SEM Courses: xe2x80xa2 AFM Tutorial and industrial applications of 3DAFM xe2x80xa2 DTSA-II, IMAGE-J, IONiSE and other Monte Carlo programs xe2x80xa2 Scanning microscopy in forensic science |
2009 IEEE International Memory Workshop (IMW) |
| May 10-14, 2009 at Hyatt Regency Monterey, Monterey California United States |
| The key initiatives for the new conference format will be: Workshop Spirit xe2x80x93 Continue with the workshop atmosphere to enable participants to interact and mingle openly. Non Volatile & Volatile xe2x80x93 Need to advertise to our colleagues about the increased scope of the conference and attract more Volatile interest. The 1st IEEE International Memory Workshop (IMW) will be held on May 10th xe2x80x93 14th, 2009 at the Hyatt in Monterey, California. The workshop is sponsored by the IEEE Electron Devices Society. The IMW is a unique forum for specialists in all aspects of nonvolatile memory microelectronics and people with different backgrounds who wish to gain a better understanding of the field. The morning and afternoon technical sessions are organized in a manner to provide ample time for informal exchanges amongst presenters and attendees. The evening panel discussions will address hot topics in the nonvolatile field. Papers are solicited in the aspects of nonvolatile semiconductor memory technology, including: |
Weldmex 2009 |
| Jun 2-4, 2009 at Cintermex Exhibition Centre, Monterey California United States |
| Since 1992, Tradeshow Consulting has produced premier expositions and conferences for the Industrial, Welding, Air Conditioning and Metalforming industries in both Mexico and the USA. Past shows include: USA/Mexico Industrial Expo Metalform Mexico AHR Expo Mexico Weldmex We provide superior customer care for both exhibitors and attendees, bringing together buyers and sellers in a neutral environment. We ask our exhibitors what types of attendees they want to reach, and we find out from attendees what products they want to see. Then by putting the two together, we help US companies identify and find Mexican distributors, representatives, and resellers. |
PHOTOMASK TECHNOLOGY 2009 |
| Sep 1, 2009 at Monterey Conference Center, Monterey California United States |
| Photo Mask Technology Exhibition |
